Miniaturized Silicon Photodetectors : New Perspectives and Applications
Casalino, Maurizio
Miniaturized Silicon Photodetectors : New Perspectives and Applications - Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021 - 1 electronic resource (148 p.)
Open Access
Silicon (Si) technologies provide an excellent platform for the design of microsystems where photonic and microelectronic functionalities are monolithically integrated on the same substrate. In recent years, a variety of passive and active Si photonic devices have been developed, and among them, photodetectors have attracted particular interest from the scientific community. Si photodiodes are typically designed to operate at visible wavelengths, but, unfortunately, their employment in the infrared (IR) range is limited due to the neglectable Si absorption over 1100 nm, even though the use of germanium (Ge) grown on Si has historically allowed operations to be extended up to 1550 nm. In recent years, significant progress has been achieved both by improving the performance of Si-based photodetectors in the visible range and by extending their operation to infrared wavelengths. Near-infrared (NIR) SiGe photodetectors have been demonstrated to have a “zero change” CMOS process flow, while the investigation of new effects and structures has shown that an all-Si approach could be a viable option to construct devices comparable with Ge technology. In addition, the capability to integrate new emerging 2D and 3D materials with Si, together with the capability of manufacturing devices at the nanometric scale, has led to the development of new device families with unexpected performance. Accordingly, this Special Issue of Micromachines seeks to showcase research papers, short communications, and review articles that show the most recent advances in the field of silicon photodetectors and their respective applications.
Creative Commons
English
books978-3-0365-0045-4 9783036500447 9783036500454
10.3390/books978-3-0365-0045-4 doi
Technology: general issues
graphene polycrystalline silicon photodiode phototransistor pixel high dynamic range (HDR) image Ni/4H-SiC Schottky barrier diodes (SBDs) C/Si ratios 1/f noise resonant cavity photodetectors near-infrared silicon p-Si/i-ZnO/n-AZO avalanche photodiode (APD) impact ionization coefficients GeSn alloys silicon photonics photonic integrated circuits microbolometer complementary metal oxide semiconductor (CMOS)-compatible uncooled infrared detectors thermal detectors infrared focal plane array (IRFPA) read-out integrated circuit (ROIC) photodetector semiconductor microphotonics group IV colloidal systems single-photon avalanche diode (SPAD) gating avalanche transients 3.3 V/0.35 µm complementary metal-oxide-semiconductor (CMOS) n/a
Miniaturized Silicon Photodetectors : New Perspectives and Applications - Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021 - 1 electronic resource (148 p.)
Open Access
Silicon (Si) technologies provide an excellent platform for the design of microsystems where photonic and microelectronic functionalities are monolithically integrated on the same substrate. In recent years, a variety of passive and active Si photonic devices have been developed, and among them, photodetectors have attracted particular interest from the scientific community. Si photodiodes are typically designed to operate at visible wavelengths, but, unfortunately, their employment in the infrared (IR) range is limited due to the neglectable Si absorption over 1100 nm, even though the use of germanium (Ge) grown on Si has historically allowed operations to be extended up to 1550 nm. In recent years, significant progress has been achieved both by improving the performance of Si-based photodetectors in the visible range and by extending their operation to infrared wavelengths. Near-infrared (NIR) SiGe photodetectors have been demonstrated to have a “zero change” CMOS process flow, while the investigation of new effects and structures has shown that an all-Si approach could be a viable option to construct devices comparable with Ge technology. In addition, the capability to integrate new emerging 2D and 3D materials with Si, together with the capability of manufacturing devices at the nanometric scale, has led to the development of new device families with unexpected performance. Accordingly, this Special Issue of Micromachines seeks to showcase research papers, short communications, and review articles that show the most recent advances in the field of silicon photodetectors and their respective applications.
Creative Commons
English
books978-3-0365-0045-4 9783036500447 9783036500454
10.3390/books978-3-0365-0045-4 doi
Technology: general issues
graphene polycrystalline silicon photodiode phototransistor pixel high dynamic range (HDR) image Ni/4H-SiC Schottky barrier diodes (SBDs) C/Si ratios 1/f noise resonant cavity photodetectors near-infrared silicon p-Si/i-ZnO/n-AZO avalanche photodiode (APD) impact ionization coefficients GeSn alloys silicon photonics photonic integrated circuits microbolometer complementary metal oxide semiconductor (CMOS)-compatible uncooled infrared detectors thermal detectors infrared focal plane array (IRFPA) read-out integrated circuit (ROIC) photodetector semiconductor microphotonics group IV colloidal systems single-photon avalanche diode (SPAD) gating avalanche transients 3.3 V/0.35 µm complementary metal-oxide-semiconductor (CMOS) n/a