Mark Goorsky <br/><br/>
Ion Implantation 

 -  IntechOpen  2012 
 - 1 electronic resource (450 p.) 
<br/><br/> Open Access 
<br/><br/> Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book. 
<br/><br/><br/>All rights reserved 
<br/><br/><br/>English 
<br/><br/><label>ISBN: </label>1881 9789535142928 9789535106340 
<br/><br/><label>Standard No.: </label>10.5772/1881  doi 
<br/><br/><label>Subjects--Index Terms: </label>Physical Sciences Engineering and Technology Materials Science Semiconductor Thermal Engineering