TY  - GEN
AU  - Vernardou,Dimitra
AU  - Vernardou,Dimitra
TI  - Advances in Chemical Vapor Deposition
SN  - books978-3-03943-924-9
PY  - 2021///
CY  - Basel, Switzerland
PB  - MDPI - Multidisciplinary Digital Publishing Institute
KW  - Technology: general issues
KW  - bicssc
KW  - APCVD
KW  - VO2
KW  - processing parameters
KW  - 2D
KW  - chemical vapor deposition
KW  - atomic layer deposition
KW  - aluminum oxide
KW  - aluminum tri-sec-butoxide
KW  - thin film
KW  - carbon nanotubes
KW  - residual gas adsorption
KW  - residual gas desorption
KW  - field emission
KW  - atmospheric pressure CVD
KW  - low pressure CVD
KW  - hybrid CVD
KW  - aerosol assisted CVD
KW  - pulsed CVD
KW  - perovskite photovoltaic nanomaterials
KW  - stabilization
KW  - structural design
KW  - performance optimization
KW  - solar cells
KW  - anatase single crystals
KW  - process-induced nanostructures
KW  - competitive growth
KW  - pp-MOCVD
KW  - vanadium pentoxide
KW  - electrochromic
KW  - spray pyrolysis
KW  - ammonium metavanadate
KW  - CVD
KW  - electrochromism
KW  - perovskite photovoltaic materials
KW  - TiO2
KW  - Al2O3
KW  - V2O5
KW  - computational fluid dynamics
N1  - Open Access
N2  - Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices
UR  - https://mdpi.com/books/pdfview/book/3311
UR  - https://directory.doabooks.org/handle/20.500.12854/68301
ER  -