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Ion Implantation

By:

Mark Goorsky [auth]

Material type: Article

ArticleLanguage: English Publication details: IntechOpen 2012Description: 1 electronic resource (450 p.)ISBN:

1881
9789535142928
9789535106340

Subject(s):

Online resources:

Summary: Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.

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Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.

English

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